Klorin trifluorida

Klorin trifluorida
Skeletal formula of chlorine trifluoride with some measurements	Spacefill model of chlorine trifluoride
Nama
	Nama IUPAC (sistematis) Trifluoro-λ3-chlorane (substitutive)
	Nama lain Chlorotrifluoride
Penanda
Nomor CAS	7790-91-2 ;
Model 3D (JSmol)	Gambar interaktif; Gambar interaktif;
3DMet	{{{3DMet}}}
ChEBI	CHEBI:30123 ;
ChemSpider	23039 ;
Nomor EC
Referensi Gmelin	1439
MeSH	chlorine+trifluoride
PubChem CID	24637;
Nomor RTECS	{{{value}}}
Nomor UN	1749
CompTox Dashboard (EPA)	DTXSID90893948 ;
	InChI InChI=1S/ClF3/c2-1(3)4 Key: JOHWNGGYGAVMGU-UHFFFAOYSA-N ; InChI=1/ClF3/c2-1(3)4 Key: JOHWNGGYGAVMGU-UHFFFAOYAB;
	SMILES F[Cl](F)F; [F-].[F-].F[Cl++];
Sifat
Rumus kimia	ClF3
Massa molar	92,45 g·mol−1
Penampilan	Colorless gas or greenish-yellow liquid
Bau	sweet, pungent, irritating, suffocating
Densitas	3.779 g/L
Titik lebur	−7.634 °C (−13.709 °F; −7.361 K)
Titik didih	1.175 °C (2.147 °F; 1.448 K) (decomposes @ 180 °C (356 °F; 453 K))
Kelarutan dalam air	Exothermic hydrolysis
Kelarutan	Reacts with benzene, toluene, ether, alcohol, acetic acid, selenium tetrafluoride, nitric acid, sulfuric acid, alkali, hexane. Soluble in CCl4 but can be explosive in high concentrations.
Tekanan uap	175 kPa
Suseptibilitas magnetik (χ)	-26.5·10−6 cm3/mol
Viskositas	91.82 μPa s
Struktur
Bentuk molekul	T-shaped
Termokimia
Kapasitas kalor (C)	63.9 J K−1mol−1
Entropi molar standar (So)	281.6 J K−1mol−1
Entalpi pembentukan standar (ΔfHo)	−163.2 kJ mol−1
Energi bebas Gibbs (ΔfG)	−123.0 kJ mol−1
Bahaya
Bahaya utama	explosive when exposed to organics, reacts violently with water
Lembar data keselamatan	natlex.ilo.ch
Piktogram GHS
Keterangan bahaya GHS	{{{value}}}
Titik nyala	noncombustible
	Dosis atau konsentrasi letal (LD, LC):
LC50 (konsentrasi median)	95 ppm (rat, 4 hr); 178 ppm (mouse, 1 hr); 230 ppm (monkey, 1 hr); 299 ppm (rat, 1 hr);
	Batas imbas kesehatan AS (NIOSH):
PEL (yang diperbolehkan)	C 0.1 ppm (0.4 mg/m3)
REL (yang direkomendasikan)	C 0.1 ppm (0.4 mg/m3)
IDLH (langsung berbahaya)	20 ppm
Senyawa terkait
Senyawa terkait	Chlorine pentafluoride; Chlorine monofluoride; Bromine trifluoride; Iodine trifluoride
	Kecuali dinyatakan lain, data di atas berlaku pada suhu dan tekanan standar (25 °C [77 °F], 100 kPa).
	verifikasi (apa ini ?)
	Referensi

Klorin trifluorida adalah sebuah senyawa interhalogen dengan rumus kimia ClF₃. Senyawa ini berwujud gas tak berwarna, beracun, korosif, dan sangat reaktif. Senyawa ini sering dijual dalam bentuk cair (dengan diberi tekanan tinggi), dan dalam wujud ini ClF₃ berwarna kuning kehijauan muda. Senyawa ini banyak digunakan sebagai bahan bakar roket, berbagai proses di industri semikonduktor,^[9]^[10]^[11] pengolahan bahan bakar nuklir,,^[12] serta proses-proses industri lainnya.^[13]

Referensi

^ "Chlorine trifluoride – Compound Summary". PubChem Compound. USA: National Center for Biotechnology Information. 16 September 2004. Identification and Related Records. Diakses tanggal 9 October 2011.
^ ClF3/Hydrazine Diarsipkan 2007-02-02 di Wayback Machine. at the Encyclopedia Astronautica.
^ ^a ^b ^c ^d ^e ^f "NIOSH Pocket Guide to Chemical Hazards #0117". National Institute for Occupational Safety and Health (NIOSH).
^ ^a ^b ^c Haynes, William M., ed. (2011). CRC Handbook of Chemistry and Physics (edisi ke-92nd). CRC Press. hlm. 4.58. ISBN 978-1-4398-5511-9.
^ ^a ^b Chlorine fluoride (ClF3) Diarsipkan 2013-10-29 di Wayback Machine. at Guidechem Chemical Network
^ Haynes, William M., ed. (2011). CRC Handbook of Chemistry and Physics (edisi ke-92nd). CRC Press. hlm. 4.132. ISBN 978-1-4398-5511-9.
^ Haynes, William M., ed. (2011). CRC Handbook of Chemistry and Physics (edisi ke-92nd). CRC Press. hlm. 5.8. ISBN 978-1-4398-5511-9.
^ "Chlorine trifluoride". Immediately Dangerous to Life and Health. National Institute for Occupational Safety and Health (NIOSH).
^ Habuka, Hitoshi; Sukenobu, Takahiro; Koda, Hideyuki; Takeuchi, Takashi; Aihara, Masahiko (2004). "Silicon Etch Rate Using Chlorine Trifluoride". Journal of the Electrochemical Society. 151 (11): G783–G787. doi:10.1149/1.1806391.
^ Xi, Ming et al. (1997) Templat:US Patent "Process for chlorine trifluoride chamber cleaning"
^ Habuka, Hitoshi (2012). "Etching of Silicon Carbide Using Chlorine Trifluoride Gas". Physics and Technology of Silicon Carbide Devices. doi:10.5772/50387. ISBN 978-953-51-0917-4.
^ Board on Environmental Studies and Toxicology, (BEST) (2006). Acute Exposure Guideline Levels for Selected Airborne Chemicals: Volume 5. Washington D.C.: National Academies Press. hlm. 40. ISBN 978-0-309-10358-9. (available from National Academies Press)
^ Boyce, C. Bradford and Belter, Randolph K. (1998) Templat:US Patent "Method for regenerating halogenated Lewis acid catalysts"

[1] "Chlorine trifluoride – Compound Summary". PubChem Compound. USA: National Center for Biotechnology Information. 16 September 2004. Identification and Related Records. Diakses tanggal 9 October 2011.

[CLFazine-2] ClF3/Hydrazine Diarsipkan 2007-02-02 di Wayback Machine. at the Encyclopedia Astronautica.

[PGCH-3] ^ ^a ^b ^c ^d ^e ^f "NIOSH Pocket Guide to Chemical Hazards #0117". National Institute for Occupational Safety and Health (NIOSH).

[crc1-4] Haynes, William M., ed. (2011). CRC Handbook of Chemistry and Physics (edisi ke-92nd). CRC Press. hlm. 4.58. ISBN 978-1-4398-5511-9.

[guidechem-5] Chlorine fluoride (ClF3) Diarsipkan 2013-10-29 di Wayback Machine. at Guidechem Chemical Network

[6] Haynes, William M., ed. (2011). CRC Handbook of Chemistry and Physics (edisi ke-92nd). CRC Press. hlm. 4.132. ISBN 978-1-4398-5511-9.

[7] Haynes, William M., ed. (2011). CRC Handbook of Chemistry and Physics (edisi ke-92nd). CRC Press. hlm. 5.8. ISBN 978-1-4398-5511-9.

[8] "Chlorine trifluoride". Immediately Dangerous to Life and Health. National Institute for Occupational Safety and Health (NIOSH).

[9] Habuka, Hitoshi; Sukenobu, Takahiro; Koda, Hideyuki; Takeuchi, Takashi; Aihara, Masahiko (2004). "Silicon Etch Rate Using Chlorine Trifluoride". Journal of the Electrochemical Society. 151 (11): G783–G787. doi:10.1149/1.1806391.

[10] Xi, Ming et al. (1997) Templat:US Patent "Process for chlorine trifluoride chamber cleaning"

[11] Habuka, Hitoshi (2012). "Etching of Silicon Carbide Using Chlorine Trifluoride Gas". Physics and Technology of Silicon Carbide Devices. doi:10.5772/50387. ISBN 978-953-51-0917-4.

[12] Board on Environmental Studies and Toxicology, (BEST) (2006). Acute Exposure Guideline Levels for Selected Airborne Chemicals: Volume 5. Washington D.C.: National Academies Press. hlm. 40. ISBN 978-0-309-10358-9. (available from National Academies Press)

[13] Boyce, C. Bradford and Belter, Randolph K. (1998) Templat:US Patent "Method for regenerating halogenated Lewis acid catalysts"

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Klorin trifluorida

Referensi

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