Oksalil fluorida
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| |||
| Nama | |||
|---|---|---|---|
| Nama IUPAC (preferensi)
Oksalil difluorida | |||
| Nama lain
TL-108
| |||
| Penanda | |||
Model 3D (JSmol)
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| ChemSpider | |||
| Nomor EC | |||
PubChem CID
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| Nomor RTECS | {{{value}}} | ||
| UNII | |||
CompTox Dashboard (EPA)
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| |||
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| Sifat | |||
| C2F2O2 | |||
| Massa molar | 94,017 g/mol | ||
| Titik lebur | −3 °C (27 °F; 270 K) | ||
| Titik didih | 26,6 °C (79,9 °F; 299,8 K) | ||
Kecuali dinyatakan lain, data di atas berlaku pada suhu dan tekanan standar (25 °C [77 °F], 100 kPa). | |||
| Referensi | |||
Oksalil fluorida adalah sebuah senyawa organofluorin dengan rumus kimia (COF)2. Senyawa ini merupakan turunan terfluorinasi dari asam oksalat. Cairan nirwarna ini dibuat melalui reaksi natrium fluorida dengan oksalil klorida.[1]
Oksail fluorida sedang diteliti untuk digunakan dalam etsa sebagai pengganti senyawa dengan potensi pemanasan global (global warming potential, GWP) tinggi.[2][3]
Lihat pula
Referensi
- ^ C. W. Tullock, D. D. Coffman (1960). "Synthesis of Fluorides by Metathesis with Sodium Fluoride". J. Org. Chem. 25 (11): 2016–2019. doi:10.1021/jo01081a050.
- ^ Method of etching and cleaning using fluorinated carbonyl compounds, US Patent 6635185.
- ^ Simon Karecki; Ritwik Chatterjee; Laura Pruette; Rafael Reif; Terry Sparks; Laurie Beu; Victor Vartanian & Konstantin Novoselovc (2001). "Evaluation of Oxalyl Fluoride for a Dielectric Etch Application in an Inductively Coupled Plasma Etch Tool". J. Electrochem. Soc. 148 (3): G141 – G149. Bibcode:2001JElS..148G.141K. doi:10.1149/1.1348263.
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